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联系方式
| 地址 | CVD Equipment Corporation 355 South Technology Drive 11722 Central Islip |
| 国家 | 美国 |
| 州 | New York |
| 电子邮箱 | Get in contact with CVD Equipment Corporation |
产品/机械
CVD Equipment Corporation designs, develops, and manufactures process equipment solutions for R&D, pilot, and production applications. Our products include a complete array of turnkey solutions such as chemical vapor deposition systems, gas & liquid delivery cabinets, gas panels, and related gas abatement systems. CVD Equipment Corporation’s headquarters and application laboratory are located on Long Island, New York, USA.
Our R&D and Production Systems include:
- Atomic Layer Deposition (ALD) Systems
- Atmospheric Pressure CVD (APCVD) Systems
- Semiconductor Crystal Growth Systems
- Chemical Vapor Infiltration (CVI) Systems
- High Temperature Annealing (HTA) Systems
- Hydride Vapor Phase Epitaxy (HVPE) Systems
- Low Pressure CVD (LPCVD) Systems
- Liquid Phase Epitaxial (LPE) Reactor Growth
- Metal Organic CVD (MOCVD) Systems
- Plasma Enhanced CVD (PECVD) Systems
- Rapid Thermal Processing (RTP) & Rapid Thermal
- Annealing (RTA) Systems
- Selenization and Sulfurization (SAS) Systems
Our Production System Technology Capabilities include:
- Automation
- Cluster Tools
- Dry Etching
- Exhaust Abatement
- Multi-Chamber Tools
- Reel-to-Reel (Roll-to-Roll)
- Vacuum Caoting
Our equipment is used worldwide for cutting edge research and high volume production for many applications such as:
- Aerospace Components
- Medical Implants
- Military
- Semiconductor/MEMS
- Solar Photovoltaics
- Nanomaterials
- Optoelectronics
- Glass Coatings
- Functional Coatings
- TCO Coatings
